The goal of this project is to automate the process of Atomic Layer Deposition (ALD) of thin films by using an Arduino system. Figure 1 displays a homemade ALD system in Professor Kummel’s lab at the Biochemistry Department of UCSD. My Arduino system (Figure 2) controlled a Mass Flow Controller (black box shown in Figure 2) to control the pumping of gas needed in the ALD process. I also built a user interface (Figure 3) for the Arduino program through Megunolink. The system allowed modification of gas pulse length and purge time of TiCl4 and N2H4, which are crucial gases used in the ALD process to generate TiN film. It also has the option to choose different Ti precursors, such as TDMAH and TDMAZ to add to the reaction. The system automated data collection and eliminated the possibility of human error. It also displayed real-time data and the progress of the ALD process through an Adafruit LCD Screen. After verifying that all hardware was connected properly, I created a PCB (schematic shown in Figure 4) in KiCad and then soldered all components.